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Tool | Use | |
---|---|---|
Required | 5x Stepper for exposure of 100mm substrates - g-line | |
Required | 5x Stepper for exposure of 150mm substrates - i-line | |
Heidelberg DWL 66+ | Required | Exposure system for direct write or maskmaking |
Required | 1x Contact Aligner for exposure of 150mm substrates - broadband/i-line | |
Required | 1x Contact Aligner for exposure of multiple size substrates - broadband | |
Required | Coat/Develop track for 150mm substrates | |
Required | Coat/Develop track for 150mm substrates | |
Required | Manual Coat for photoresist only - 100/150mmmultiple sizes | |
Required | Manual Coat for SU8 / Polyimides / SOG -multiple sizes | |
CEE Resist Coat Station | Required | Manual HMDS Prime and manual Coat for photoresist only - 100/150mm |
Required | Manual Develop for photoresist - 100/150mm |
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