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Trion PECVD
Facts
The Trion PECVD is an ICP chemical vapor deposition systems
It is plumbed with SiH4, NH3, CF4, O2, N2
It is used for the deposition of Silicon Nitride and Silicon Dioxide on III-V substrates
Personnel
Equipment Engineer - Rich Battaglia
Process Engineer - Sean O'Brien
Super User - Venkatesh Deenadaylan
Any of these personnel can certify new users
Tool & Process Information