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Lithography

Jul 27, 2021

Exposure Tool

ASML PAS 5500/200 i-line 5x Stepper

0.35um capable - 150mm wafers

GCA g-line 5x Stepper

~1.0um capable - 100mm wafers

Heidelberg DWL 66+

~ 0.8um features with 4mm head
~ 4.0um features with 20mm head

Karl Suss MA150 1x Contact Aligner

~2um capable - 150 mm wafers - i-line filtering for better resolution

Karl Suss MJB4 1x Contact Aligner

~2um capable - multiple size substrates

Coat / Develop Tracks

SVG 88 Coat/Develop Track #1

Set up for 150mm wafers - MiR 701 resist dispense

SVG 88 Coat/Develop Track #2

Set up for 150mm wafers - MiR 701 resist dispense

Manual Coat / Develop Tools

CEE Photoresist Spin Coater

Use for manual coating of positive photoresists

CEE Manual Spin Coating Station

Use for manual HDMS prime / coating of positive photoresists

CEE General Spin Coater

Use for manual coating of photoresists, SU8, Polyimides, & Spin on Glass

CEE Manual Developer

Use for manual spray development of positive photoresists