Lithography

Exposure Tool

ASML PAS 5500/200 i-line 5x Stepper

• 0.35um capable - 150mm wafers

GCA g-line 5x Stepper

• ~1.0um capable - 100mm wafers

Heidelberg DWL 66+

• ~ 0.8um features with 4mm head
• ~ 4.0um features with 20mm head

Karl Suss MA150 1x Contact Aligner

• ~2um capable - 150 mm wafers - i-line filtering for better resolution

Karl Suss MJB4 1x Contact Aligner

• ~2um capable - multiple size substrates

Coat / Develop Tracks

SVG 88 Coat/Develop Track #1

• Set up for 150mm wafers - MiR 701 resist dispense

SVG 88 Coat/Develop Track #2

• Set up for 150mm wafers - MiR 701 resist dispense

Manual Coat / Develop Tools

CEE Photoresist Spin Coater

• Use for manual coating of positive photoresists

CEE Manual Spin Coating Station

• Use for manual HDMS prime / coating of positive photoresists

CEE General Spin Coater

• Use for manual coating of photoresists, SU8, Polyimides, & Spin on Glass

CEE Manual Developer

• Use for manual spray development of positive photoresists