Wet Bench - RCA MOS Clean

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Facts

This wet bench is configured to perform the RCA Cleaning Process

• Used for MOS grade wafers prior to gate oxidation.

  • No gold, copper, other trap inducing materials.

• Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).

• A 50:1 HF tank is in the bench for native oxide removal.

• Rinse tanks for each process step are also in the bench.

• The wetbench also has a heated quartz bath for Piranha Cleans .

Personnel

• Tool Engineer -

• Process Engineer - Sean O'Brien

• Super User - Eli Powell

• Super User - Patricia Meller

• Super User - Karl Hirschman

Tool & Process Information

• Wet Chemical Processing Information

Manuals & Users

• MOS RCA Bench Manual - Rev C - 5/26/20

• MOS RCA Wetbench Certification Checklist - 8/5/08