Bruce 2 - Tube 5

Open

Facts

Tube 5 is used for the wet oxidation of silicon dioxide.

• It is equipped with an external torch to produce steam oxide at lower temperatures

• Uses hydrogen gas and oxygen to produce a steam for the faster growth of silicon dioxide.

• Wafers are loaded into quartz boats - current sizes are 100mm & 150mm.

• Tube is considered contaminated - not qualified for MOS grade process.

• Currently reserved for Dr. Hirschman's Research

Other Tubes

• Bruce Tube 1 - Wet Oxide Growth

• Bruce Tube 2 - P type diffusion

• Bruce Tube 3 - N type diffusion

• Bruce Tube 4 - Dry Oxide Growth

• Bruce Tube 5 - External Torch Low Temp Oxide Growth

• Bruce Tube 6 - Wet Oxide Growth

• Bruce Tube 7 - Anneal

• Bruce Tube 8 - High Temp Anneal

Personnel

• Tool Engineer - 

• Process Engineer - Sean O'Brien

• Process Engineer - Patricia Meller

Tool & Process Information

• Bruce Furnace Recipe Request Sheet

  • If a new recipe is needed for the Bruce Furnace, fill out this sheet and return to Sean O'Brien

Manuals & Users