Plasma / Reactive Ion Etch
Trion Minilock Etcher
- Used for reactive ion etching of silicon oxide
Trion Phantom III Etcher
- Used for reactive ion etching of silicon nitride and poly-silicon
Trion ICP Etcher
- Used for etching of dielectrics over III-V materials
AME P5000 Chamber C
- Used for reactive ion etching of silicon dioxide
Plasmatherm ICP Cl Etcher
- Used for ICP chlorine etching of III-V mterials
Oxygen Plasma Strippers
Trion Apollo Asher
- Used for oxygen plasma ashing of photoresists
Other Etchers
Xactic XeF2 Etcher
- Used for surface release etching silicon
STS ASE Deep Si Etcher
- Used for deep anisotropic etches of SI
Dry Etch Process Information