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Ultratech ALD
Facts
The Ultratech S200 G2 Savannah ALD system is a single chamber atomic layer deposition system.
It has six precursor channels number 0-5 and has
Deionized H2O,
HfO2 - Tetrakis Dimethyl Hafnium
Al2O3 - Trimethyl Aluminum
TiO2 - Tetrakis Dimethyl Titanium
ZrO2 - Tetrakis Dimethyl Zirconium
ZiO - Diethyl Zinc (chamber needs an overcoat of HfO2 after zinc depostions)
Precursors can change with the needs of users but must be scheduled with the SMFL to make any changes.
Personnel
Equipment Engineer
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Super User - Karl Hirschman
Super User - Eli Powell
Super User - William Huang
Any of these personnel can certify new users
Tool & Process Information
ALD Deposition Information
Manuals
ALD Certification Checklist