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Wet Bench - Al Etch and Solvent Strip
Facts
This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.
Solvent Strip Tanks use AZ400 Resist Stripper
Aluminum Etch Tank uses Fuji 16:1:1:2 Aluminum Etch
Personnel
Tool Engineer -
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Super User - Karl Hirschman