Trion Phantom III

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Facts

• The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.

• The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching. 

• The Trion is plumbed with SF₆, CF₄, CHF₃ and O₂. 

Personnel

• Tool Engineer - Rich Battaglia

• Process Engineer - Sean O'Brien

• Super User - William Huang

• Any of these personnel can certify new users

Tool & Process Information

Manuals

• Trion Phantom III Manual - Rev F - 5/18/22

• Trion Phantom III Certification Checklist