Trion ICP Etcher

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Facts

• The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.

• The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.

• The system is currently plumbed with .

• No metals & metal etching is allowed in this tool

Personnel

• Tool Engineer - Rich Battaglia

• Process Engineer - Sean O'Brien

• Super User - Patricia Meller

• Any of these personnel can certify new users

Tool & Process Information

Manuals

• Trion ICP Manual - Rev B - 6/2/20

• Trion ICP Certification Checklist