Trion ICP Etcher
Facts
- The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
- The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
- The system is currently plumbed with .
- No metals & metal etching is allowed in this tool
Personnel
- Tool Engineer -Â Rich Battaglia
- Process Engineer -Â Sean O'Brien
- Super User -Â Patricia Meller
- Any of these personnel can certify new users
Tool & Process Information
Manuals
- Trion ICP Manual - Rev B - 6/2/20
- Trion ICP Certification Checklist