Trion ICP Etcher

Facts

• The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
• The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
• The system is currently plumbed with .
• No metals & metal etching is allowed in this tool

Personnel

• Tool Engineer - Rich Battaglia
• Process Engineer - Sean O'Brien
• Super User - Patricia Meller
• Any of these personnel can certify new users

Tool & Process Information

Manuals

• Trion ICP Manual - Rev B - 6/2/20
• Trion ICP Certification Checklist