Trion ICP Etcher

Facts

  • The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
  • The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
  • The system is currently plumbed with .
  • No metals & metal etching is allowed in this tool

Personnel

Tool & Process Information


Manuals