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Trion ICP Etcher
Facts
The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
The system is currently plumbed with .
No metals & metal etching is allowed in this tool
Personnel
Tool Engineer - Rich Battaglia
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Any of these personnel can certify new users
Tool & Process Information
Manuals
Trion ICP Certification Checklist