CVC 601 DC Sputter
- Sean O'Brien
- jcn8004
Owned by Sean O'Brien
Mar 14, 2014
Loading data...
The CVC 601 is a 4 target DC Sputter system. There are three 8-inch targets and one 4-inch target.
| Mo Sputter Process | |
|---|---|
| Argon flow | 20 sccm |
| Pressure | 2.7 mT |
| Power | 1000W |
| Deposition Rate | 160 Å/min. |
Deposition Stdev (center to edge) | 4.2% |
| Stress | 969 MPa (Tensile) |
| Resistivity | 21 μΩcm |
| Al Sputter Process | |
|---|---|
| Argon flow | 20 sccm |
| Pressure | 5 mT |
| Power | 2000W |
| Deposition Rate | 375 Å/min. |
| Stress | MPa |
| Resistivity |