CVC 601 DC Sputter

Owned by Sean O'Brien
Mar 14, 2014
1 min read

The CVC 601 is a 4 target DC Sputter system.  There are three 8-inch targets and one 4-inch target.


Mo Sputter Process 
Argon flow20 sccm
Pressure2.7 mT
Power1000W
Deposition Rate160 Ã…/min.

Deposition Stdev

(center to edge)

4.2% 
Stress

969 MPa

(Tensile)

Resistivity21 μΩcm
Al Sputter Process 
Argon flow20 sccm
Pressure5 mT
Power2000W
Deposition Rate

 375 Å/min.

Stress MPa
Resistivity 

Process for improved aluminum step coverage in CVC 601