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CVC 601 DC Sputter
The CVC 601 is a 4 target DC Sputter system. There are three 8-inch targets and one 4-inch target.
Mo Sputter Process |
|
|---|---|
Argon flow | 20 sccm |
Pressure | 2.7 mT |
Power | 1000W |
Deposition Rate | 160 Å/min. |
Deposition Stdev (center to edge) | 4.2% |
Stress | 969 MPa (Tensile) |
Resistivity | 21 μΩcm |
Al Sputter Process |
|
|---|---|
Argon flow | 20 sccm |
Pressure | 5 mT |
Power | 2000W |
Deposition Rate | 375 Å/min. |
Stress | MPa |
Resistivity |
|