Wet Bench - RCA General Clean

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Facts

This wet bench is configured to perform the RCA Cleaning Process.

• Silicon wafers that have seen previous processing are allowed

  • Wafers that might not be allowed in the MOS RCA Bench could be processed in this bench.

  • No gold, copper, other trap inducing materials.

• Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).

• A 50:1 HF tank is in the bench for native oxide removal.

• Rinse tanks for each process step are also in the bench.

Personnel

• Tool Engineer - 

• Process Engineer - Sean O'Brien

• Superuser - Patricia Meller

• Superuser - Karl Hirschman

• Superuser - Eli Powell

Tool & Process Information

• Wet Chemical Processing Information

Manuals & Users

• General RCA Bench Manual

• General RCA Wetbench Certification Checklist