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Heidelberg DWL 66 Laser Writer
Facts
The DWL 66+ is a high-resolution imaging system developed to expose photoresist coatings on a variety of substrates.
Substrates up to 8" x 8" can be exposed.
Exposure wavelength is 405nm from a solid state laser.
The system is also the SMFL maskmaking tool.
Design data can be created by any program using DXF, Gerber, GDSII, or CIF format.
3D structures in thick photoresist can be created by using the Advanced Gray Scale Exposure Mode.
Two lenses are available
20mm head - 4.0um features
4mm head - 0.8 um features
Personnel
Tool/Process Engineer - Sean O'Brien
Superuser - Eli Powell
Any of these personnel can certify new users