Xactix Etcher

This Confluence space has been migrated and is no longer current. The content on this space has been set to read only.

Xactix Etcher


Facts

The Xactix Etcher is an non-plasma dry etch tool.

  • It employs XeF2 to bulk etch exposed silicon surfaces.

  • It is intended as a release etch for silicon in MEMs applications

  • It is not intended as a deep silicon etcher or a through-hole etcher, and is completely isotropic

Personnel

  • Tool Engineer - John Nash

  • Process Engineer - Sean O'Brien

  • Any of these personnel can certify new users

Tool & Process Information

 

Manuals