This Confluence space has been migrated and is no longer current. The content on this space will no longer be accessible after July 1, 2026.
Wet Bench - Nitride and Silicon Etch
Facts
This wet bench is set up for a variety of chemical processes.
There is a heated quartz bath with a condensation coil for hot phosphoric acid etching of silicon nitride.
There is a heated quartz bath with potassium hydroxide (KOH) for crystallographic etching of silicon.
In addition, there are several tanks with BOE and Freckle Etch for silicon dioxide etching.
Personnel
Tool Engineer -
Process Engineer - Sean O'Brien
SuperUser - Patricia Meller