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Wet Bench - Nitride and Silicon Etch
Wet Bench - Nitride and Silicon Etch
Facts
This wet bench is set up for a variety of chemical processes.
- There is a heated quartz bath with a condensation coil for hot phosphoric acid etching of silicon nitride.
- There is a heated quartz bath with potassium hydroxide (KOH) for crystallographic etching of silicon.
- In addition, there are several tanks with BOE and Freckle Etch for silicon dioxide etching.
Personnel
- Tool Engineer -
- Process Engineer - Sean O'Brien
- SuperUser - Patricia Meller
Tool & Process Information
Manuals & Users
, multiple selections available,
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