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- Tool Engineer - Bruce Tolleson
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
Tool & Process Information
- The Nanospec may be used to manually measure film thickness on wafers, wafer pieces or individual devices. Magnification ranges from 5x to 100x.
- If you do not see the octogon, make sure the aperture is closed.
- The filter should always be in, unless the tool tells you to take it out. (Nitride on Oxide)
- When measuring Thin Oxide or Thin Nitride, it is very important to carefully focus on the reference wafer as well as the sample, because the system is only measuring the intensity of a single wavelength.
| Program | Index | Range | Filter | |
|---|---|---|---|---|
| 1 | Oxide on Si | 1.45 | 400-30,000Å | In |
| 2 | Nitride on Si | 2.00 | 400-10,000Å | In |
| 3 | Negative Resist on Si | 1.55 | 500-40,000Å | In |
| 4 | Polysilicon on Oxide | 3.0 | 400-10,000Å | In |
| 5 | Negative Resist on Si | 1.55 | 4,000-30,000Å | In |
| 6 | Nitride on Oxide | 2.00 | 300-3,500Å | Out |
| 7 | Thin Oxide on Si | 1.45 | 100-500Å | In |
| 8 | Thin Nitride on Si | 2.00 | 100-500Å | In |
| 9 | Polyimide on Si | 1.78 | 500-10,000Å | In |
| 10 | Positive Resist on Si | 1.64 | 500-40,000Å | In |
| 11 | Positive Resist on Oxide | 1.64 | 4,000-30,000Å |