Facts
This wet bench is configured to perform the RCA Cleaning Process.
- Silicon wafers that have seen previous processing are allowed
- Wafers that might not be allowed in the MOS RCA Bench could be processed in this bench.
- No gold, copper, other trap inducing materials.
- Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
- A 50:1 HF tank is in the bench for native oxide removal.
- Rinse tanks for each process step are also in the bench.
Personnel
- Tool Engineer -
- Process Engineer - Sean O'Brien
- Process Engineer - Patricia Meller
- Superuser - Karl Hirschman
- Superuser - Eli Powell