Facts
- The Trion Minilock etcher is a reactive ion etcher set up for 100 or 150mm wafers.
- The Trion is a loadlocked system and is used for the reactive ion etching of silicon dioxide.
- The system is currently plumbed with Argon, Oxygen, CHF3 and CF4.
Personnel
- Tool Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
- Any of these personnel can certify new users