Facts
- The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.
- The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching.
- The Trion is plumbed with SF6SF6, CF4CF4, CHF3 CHF3 and O2O2.
Personnel
- Tool Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Patricia MellerWilliam Huang
- Any of these personnel can certify new users
Tool & Process Information
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Process Information
Manuals
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- Trion Phantom III Manual - Rev F - 5/18/22
- Trion Phantom III Certification Checklist