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Trion Phantom III
Facts
The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.
The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching.
The Trion is plumbed with SF6, CF4, CHF3 and O2.
Personnel
Tool Engineer - Rich Battaglia
Process Engineer - Sean O'Brien
Super User - William Huang
Any of these personnel can certify new users
Tool & Process Information
Manuals
Trion Phantom III Certification Checklist