Trion Phantom III

Facts

• The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.
• The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching. 
• The Trion is plumbed with SF₆, CF₄, CHF₃ and O₂. 

Personnel

• Tool Engineer - Rich Battaglia
• Process Engineer - Sean O'Brien
• Super User - William Huang
• Any of these personnel can certify new users

Tool & Process Information

Manuals

• Trion Phantom III Manual - Rev F - 5/18/22
• Trion Phantom III Certification Checklist