Facts
- The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
- The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
- The system is currently plumbed with .
- No metals & metal etching is allowed in this tool
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- Tool Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
- Any of these personnel can certify new users
Tool & Process Information
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Process Information
Manuals
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- Trion ICP Manual - Rev B - 6/2/20
- Trion ICP Certification Checklist