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Facts
- The DWL 66+ is a high-resolution imaging system developed to expose photoresist coatings on a variety of substrates.
- Substrates up to 8" x 8" can be exposed.
- Exposure wavelength is 405nm from a solid state laser.
- The system is also the SMFL maskmaking tool.
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- Tool/Process Engineer - Sean O'Brien
- Superuser - Emily Kessler-LewisEli Powell
- Any of these personnel can certify new users
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