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Facts
The Xactix Etcher is an non-plasma dry etch tool.
- It employs XeF2 XeF2 to bulk etch exposed silicon surfaces.
- It is intended as a release etch for silicon in MEMs applications
- It is not intended as a deep silicon etcher or a through-hole etcher, and is completely isotropic
Personnel
- Tool Engineer - John Nash
- Process Engineer - Sean O'Brien
- Any of these personnel can certify new users
Tool & Process Information
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Process Information
Manuals
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- Xactix Etcher Manual
- Xactix Etcher Certification Checklist
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