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- The Trion Minilock etcher is a reactive ion etcher set up for 100 or 150mm wafers.
- The Trion is a loadlocked system and is used for the reactive ion etching of silicon dioxide.
- The system is currently plumbed with Argon, Oxygen, CHF3 CHF3 and CF4CF4.
Personnel
- Tool Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller William Huang
- Any of these personnel can certify new users
Tool & Process Information
Manuals
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