Skip to end of metadata
Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

« Previous Version 2 Next »

Facts

  • The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
  • The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
  • The system is currently plumbed with .
  • No metals & metal etching is allowed in this tool

Personnel

Tool & Process Information

Manuals & Users

  • No labels