Skip to end of metadata
Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

« Previous Version 2 Current »

Facts

The Xactix Etcher is an non-plasma dry etch tool.

  • It employs XeF2 to bulk etch exposed silicon surfaces.
  • It is intended as a release etch for silicon in MEMs applications
  • It is not intended as a deep silicon etcher or a through-hole etcher, and is completely isotropic

Personnel

Tool & Process Information


Manuals & Users


  • No labels