Skip to end of banner Go to start of banner

Trion Minilock Etcher

Skip to end of metadata

Created by Thomas Grimsley, last modified on Jan 10, 2024

Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

Facts

The Trion Minilock etcher is a reactive ion etcher set up for 100 or 150mm wafers.
The Trion is a loadlocked system and is used for the reactive ion etching of silicon dioxide.
The system is currently plumbed with Argon, Oxygen, CHF₃ and CF₄.

Personnel

Tool Engineer - Rich Battaglia
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Any of these personnel can certify new users

Tool & Process Information

Manuals & Users

No labels