...
- Tool Engineer - John Nash
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
- Any of these personnel can certify new users
Manuals
- P5000 Manual - Rev H - 4/6/17
- P5000 Certification Checklist - 9/17/09
Process Information
- Chamber C can only etch silicon wafers with clean backs.
- All oxide and nitride must be removed from the backs to prevent system arcing.
- Glass wafers are not allowed due to arcing.
...