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AME P5000 Chamber C

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Created by Thomas Grimsley on May 26, 2022

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Facts

The AME P5000 is a multi-chamber tool set up for a variety of processes

Chamber C - RIE of Silicon Dioxide
- CHF3, CF4, and O2 are used to reactively ion etch silicon dioxide.

Other Chambers
- AME P5000 Chamber A - PECVD of TEOS Silicon Dioxide

Personnel

Tool Engineer - John Nash
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Any of these personnel can certify new users

Manuals & Users

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