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Plasmatherm ICP Cl Etcher

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Created by Thomas Grimsley, last modified on Jan 11, 2024

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Facts

The system is currently plumbed with Cl2 and BCl3
Used for etching II-V materials

Personnel

Tool Engineer - John Nash
Process Engineer - Sean O'Brien
Super User - Bryan Melanson
Super User - Matt Seitz
Any of these personnel can certify new users

Tool & Process Information

Manuals & Users

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