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Trion Minilock Etcher

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Created by Thomas Grimsley, last modified on Jan 11, 2024

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Facts

The Trion Minilock etcher is a reactive ion etcher set up for 100 or 150mm wafers.
The Trion is a loadlocked system and is used for the reactive ion etching of silicon dioxide.
The system is currently plumbed with Argon, Oxygen, CHF₃ and CF₄.

Personnel

Tool Engineer - Rich Battaglia
Process Engineer - Sean O'Brien
Super User - William Huang
Any of these personnel can certify new users

Tool & Process Information

Manuals & Users

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