Skip to end of metadata
Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

« Previous Version 2 Next »

Facts

  • The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.
  • The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching. 
  • The Trion is plumbed with SF6, CF4, CHF3 and O2. 

Personnel

Tool & Process Information


Manuals & Users

  • No labels