Skip to end of metadata
Go to start of metadata

You are viewing an old version of this content. View the current version.

Compare with Current View Version History

« Previous Version 2 Current »

AME P5000 Chamber A

  • Used for PECVD Deposition of TEOS Oxide

Trion PECVD

  • Used for deposition of nitride and silicon dioxide on III-V materials/substrates

Ultratech S200 ALD

  • Deposition of atomic layer films

Other Information

SMFL CVD Process Information

Good overview of CVD Processes

  • No labels