Chemical Vapor Deposition

Owned by Thomas Grimsley
Last updated: Jan 10, 2024

AME P5000 Chamber A

  • Used for PECVD Deposition of TEOS Oxide

Trion PECVD

  • Used for deposition of nitride and silicon dioxide on III-V materials/substrates

Ultratech S200 ALD

  • Deposition of atomic layer films