Trion PECVD

Facts

The Trion PECVD is an ICP chemical vapor deposition systems 

• It is plumbed with SiH4, NH3, CF4, O2, N2
• It is used for the deposition of Silicon Nitride and Silicon Dioxide on III-V substrates

Personnel

• Equipment Engineer - Rich Battaglia
• Process Engineer - Sean O'Brien
• Super User - Venkatesh Deenadaylan
• Any of these personnel can certify new users

Tool & Process Information

Manuals

• Trion PECVD Manual - Rev B - 5/21/21

• Trion Orion PECVD Certification Checklist - 5/21/21