Trion PECVD
Facts
The Trion PECVD is an ICP chemical vapor deposition systems
- It is plumbed with SiH4, NH3, CF4, O2, N2
- It is used for the deposition of Silicon Nitride and Silicon Dioxide on III-V substrates
Personnel
- Equipment Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Venkatesh Deenadaylan
- Any of these personnel can certify new users