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Facts
Tube 1 is used for the wet oxidation of silicon dioxide.
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- Bruce Tube 1 - Wet Oxide Growth
- Bruce Tube 2 - P type diffusion
- Bruce Tube 3 - N type diffusion
- Bruce Tube 4 - Dry Oxide Growth
- Bruce Tube 5 - External Torch Low Temp Oxide Growth
- Bruce Tube 6 - Wet Oxide Growth
- Bruce Tube 7 - Anneal
- Bruce Tube 8 - High Temp Anneal
Personnel
- Tool Engineer - John Nash
- Tool Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Process Engineer Superuser - Patricia Meller
- Superuser - Karl Hirschman
Tool & Process Information
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