Bruce 1 - Tube 4

Facts

Tube 4 is used for the dry oxidation of silicon dioxide.

• Wafers are loaded into quartz boats - current sizes include 75mm, 100mm & 150mm.
• Clean wafers only - no wafers with previous metal, CMP, KOH processing
• Wafers should receive a MOS RCA clean prior to processing in this tube

Other Tubes

• Bruce Tube 1 - Wet Oxide Growth
• Bruce Tube 2 - P type diffusion
• Bruce Tube 3 - N type diffusion
• Bruce Tube 4 - Dry Oxide Growth
• Bruce Tube 5 - External Torch Low Temp Oxide Growth
• Bruce Tube 6 - Wet Oxide Growth
• Bruce Tube 7 - Anneal
• Bruce Tube 8 - High Temp Anneal

Personnel

• Tool Engineer - 
• Process Engineer - Sean O'Brien
• Process Engineer - Patricia Meller

Tool & Process Information

• Bruce Furnace Recipe Request Sheet
  • If a new recipe is needed for the Bruce Furnace, fill out this sheet and return to Sean O'Brien

Manuals & Users

• Bruce Furnace Manual
• Bruce Furnace Certification Checklist