Thermal & Implant

Rapid Thermal Anneal

AG 610A RTP

• Annealing of clean MOS grade silicon wafers

Furnaces

Bruce Tube 1

• Used for wet oxidation of silicon substrates

Bruce Tube 2

• Used for diffusion of p-type dopants

Bruce Tube 3

• Used for diffusion of n-type dopants

Bruce Tube 4

• Used for dry oxidation of silicon substrates

Bruce Tube 5

• Fitted with external torch for low temp wet oxide growth

Bruce Tube 6

• Used for wet oxidation of silicon substrates

Bruce Tube 7

• Used for anneals & wet oxide growth

Bruce Tube 8

• Used for high temperature anneals

Implant

Varian 350D Implanter

• Used for implantation of boron and phosphorous