Bruce 2 - Tube 7

Facts

Tube 7 is used for the annealing & wet oxide growth of silicon substrates.

• Wafers are loaded into quartz boats - current size is 100mm.
• Currently reserved for Dr. Hirschman's Research
• Tube is considered contaminated - not qualified for MOS grade process.

Other Tubes

• Bruce Tube 1 - Wet Oxide Growth
• Bruce Tube 2 - P type diffusion
• Bruce Tube 3 - N type diffusion
• Bruce Tube 4 - Dry Oxide Growth
• Bruce Tube 5 - External Torch Low Temp Oxide Growth
• Bruce Tube 6 - Wet Oxide Growth
• Bruce Tube 7 - Anneal
• Bruce Tube 8 - High Temp Anneal

Personnel

• Tool Engineer - 
• Process Engineer - Sean O'Brien
• Process Engineer - Patricia Meller

Tool & Process Information

• Bruce Furnace Recipe Request Sheet
  • If a new recipe is needed for the Bruce Furnace, fill out this sheet and return to Sean O'Brien

Manuals & Users

• • Bruce Furnace Manual
  • Bruce Furnace Certification Checklist