Bruce 1 - Tube 1

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Facts

Tube 1 is used for the wet oxidation of silicon dioxide.

• Uses hydrogen gas and oxygen to produce a steam for the faster growth of silicon dioxide.

• Wafers are loaded into quartz boats - current sizes include 75mm, 100mm & 150mm.

• Maximum oxide growth is kept to <2um.

• Clean wafers only - no previous metal processing

Other Tubes

• Bruce Tube 1 - Wet Oxide Growth

• Bruce Tube 2 - P type diffusion

• Bruce Tube 3 - N type diffusion

• Bruce Tube 4 - Dry Oxide Growth

• Bruce Tube 5 - External Torch Low Temp Oxide Growth

• Bruce Tube 6 - Wet Oxide Growth

• Bruce Tube 7 - Anneal

• Bruce Tube 8 - High Temp Anneal

Personnel

• Tool Engineer - John Nash

• Tool Engineer - Rich Battaglia

• Process Engineer - Sean O'Brien

• Superuser - Patricia Meller

• Superuser - Karl Hirschman

Tool & Process Information

• Bruce Furnace Recipe Request Sheet

  • If a new recipe is needed for the Bruce Furnace, fill out this sheet and return to Sean O'Brien

Manuals & Users

• Bruce Furnace Manual

• Bruce Furnace Certification Checklist