Wet Chemical Process

Al Etch / Solvent Wet Bench

• One heated tank for wet etching of aluminum
• Two heated tanks for staged solvent stripping of photoresist

BOE / Pad Etch Wet Bench

• Used for silicon oxide etch

General RCA Bench

• Used for the RCA Clean of non-MOS critical silicon wafers

Manual Processing 1 Wet Bench

• Used for general purpose manual chemical processing

Manual Processing 2 Wet Bench

• Used for general purpose manual chemical processing
• Bath for HCl decontamination of wafers after KOH etch

Manual Processing 3 Wet Bench

• Used for general purpose manual chemical processing
• Cascade tank for III-V materials and other contamination threat substrates

Manual Processing 4 Wet Bench

• Used for general purpose manual chemical processing

MOS RCA Clean Wet Bench

• Used for the RCA Clean of MOS critical silicon wafers

Nitride Etch / KOH Wet Bench

• Heated bath for KOH etching of silicon
• Heated bath for phosphoric acid etching of silicon nitride
• Dedicated tanks for HF /BOE Processing

Ultrasonic Wet Bench

• Used for the ultrasonic cleaning of silicon wafers - also used in liftoff processes.

Other Information

Wet Etch Process Information