Wet Bench - Al Etch and Solvent Strip
Facts
This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.
- Solvent Strip Tanks use AZ400 Resist Stripper
- Aluminum Etch Tank uses Fuji 16:1:1:2 Aluminum Etch
Personnel
- Tool Engineer -
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
- Super User - Karl Hirschman