Wet Bench - Al Etch and Solvent Strip

Facts

This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.

• Solvent Strip Tanks use AZ400 Resist Stripper
• Aluminum Etch Tank uses Fuji 16:1:1:2 Aluminum Etch

Personnel

• Tool Engineer -
• Process Engineer - Sean O'Brien
• Super User - Patricia Meller
• Super User - Karl Hirschman

Tool & Process Information

• Wet Chemical Processing Information

Manuals & Users

• Aluminum Etch & Solvent Strip Bench Manual - Rev H - 042122
• Aluminum Etch & Solvent Strip Wetbench Certification Checklist - 121003