Wet Bench - RCA MOS Clean

Facts

This wet bench is configured to perform the RCA Cleaning Process

• Used for MOS grade wafers prior to gate oxidation.
  • No gold, copper, other trap inducing materials.

• Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
• A 50:1 HF tank is in the bench for native oxide removal.
• Rinse tanks for each process step are also in the bench.
• The wetbench also has a heated quartz bath for Piranha Cleans .

Personnel

• Tool Engineer -
• Process Engineer - Sean O'Brien
• Super User - Eli Powell
• Super User - Patricia Meller
• Super User - Karl Hirschman

Tool & Process Information

• Wet Chemical Processing Information

Manuals & Users

• MOS RCA Bench Manual - Rev C - 5/26/20
• MOS RCA Wetbench Certification Checklist - 8/5/08