HCl Decontamination Clean
- Sean O'Brien
Owned by Sean O'Brien
Aug 06, 2013
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The HCl Decontamination Clean is for cleaning wafers that have been through KOH etching or CMP. See the manual for the Manual Process #2 Bench for details.
| HCl Decontamination Clean | |
|---|---|
| DI Water | 4500 mL |
| HCl | 900 mL |
| H2O2 | 900 mL |
| Temperature | 70°C |
| Time | 20 min. |