Wet Etch Rates
This table is intended to be a relative comparison of etch rates. Etch rates will vary and should be verified before use.
Etch Rates in Å/min | 10:1 BOE @20.7°C | 10:1 BOE w/surf @20.7°C | 5.2:1 BOE @20.6°C | 20:1 Slope Etch @20.6°C | 50:1 HF @20.3°C | 16:3:3 Pad Etch @20.4°C | 20% KOH @75°C | Phosphoric Acid @163°C | 16:1:1:2 Aluminum Etch @39.4°C | Freckle Etch @20.7°C |
---|---|---|---|---|---|---|---|---|---|---|
Thermal Oxide | 532 | 582 | 1298 | 319 | 118 | 623 | 23 | 1 | 3 | 11 |
Low Temperature Oxide @425°C | 1394 | 1574 | 4742 | 1106 | 524 | 2335 | 145 | 10 | 6 | 68 |
TEOS @390°C | 1175 | 1632 | 3898 | 648 | 465 | 1765 | 125 | 11 | 6 | 69 |
Factory Nitride @810°C | 19 | 15 | 25 | 12 | 22 | 23 | <1 | 51 | 0 | <1 |
Stochiometric Nitride @800°C | 9 | 2 | 14 | 7 | 12 | 14 | <1 | 46 | 1 | 2 |
Low Pressure Nitride @800°C | 11 | 9 | 16 | 10 | 12 | 13 | <1 | 46 | 1 | 1 |
Plasma Nitride- Conventional @400°C | 272 | 5 | 378 | <1 | 175 | 128 | 25 | 760 | <1 | 168 |
(100) Silicon | na | na | na | na | na | na | 5942 | na | na | na |
Aluminum/1% Si-CVC601 | 529 | na | 524 | 473 | 1466 | 594 | na | na | 2640 | 247 |