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Dry Etch
Tool | Use | |
|---|---|---|
Required | Plasma Etch of silicon and silicon nitride | |
Required | Reactive Ion Etching of silicon dioxide | |
| Plasmatherm ICP Cl Etch | Required | Used for dry etching of III-V substrates - chlorine |
| Trion Apollo Asher | Required | Used for O2 plasma ash removal of photoresist |
Required | Used for reactive ion etching of silicon dioxide | |
| Trion Phantom III Reactive Ion Etcher | Required | Used for reactive ion etching of silicon & silicon nitride |
| Trion ICP RIE | Required | |
| STS ASE Deep Silicon Etcher | Required | Deep silicon etching using the Bosch Process |
Required | Used for surface release etching of silicon |
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