Wet Bench - RCA General Clean

Facts

This wet bench is configured to perform the RCA Cleaning Process.

• Silicon wafers that have seen previous processing are allowed
  • Wafers that might not be allowed in the MOS RCA Bench could be processed in this bench.
  • No gold, copper, other trap inducing materials.

• Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
• A 50:1 HF tank is in the bench for native oxide removal.
• Rinse tanks for each process step are also in the bench.

Personnel

• Tool Engineer - 
• Process Engineer - Sean O'Brien
• Superuser - Patricia Meller
• Superuser - Karl Hirschman
• Superuser - Eli Powell

Tool & Process Information

• Wet Chemical Processing Information

Manuals & Users

• General RCA Bench Manual
• General RCA Wetbench Certification Checklist